The
sputtering process was used to deposit a thin layer of gold on the substrate.
利用溅射过程在基板上沉积了一层薄的金。
The
sputter gun produced a steady stream of metal particles.
溅射枪产生了一股持续的金属粒子流。
Sputtering is a common method in semiconductor manufacturing for creating thin films.
溅射是半导体制造中创建薄膜的常用方法。
The researchers observed a change in the
sputtering rate with varying gas pressure.
研究人员发现随着气体压力的变化,溅射速率有所改变。
During
sputtering, atoms are ejected from the target material and deposited onto the surface.
在溅射过程中,靶材的原子被弹出并沉积到表面。
The
sputter-coated coating showed excellent adhesion to the metal substrate.
溅射镀膜对金属基底有极好的附着力。
In a
sputtering chamber, argon gas is ionized and accelerated to bombard the target.
在溅射室中,氩气被电离并加速撞击靶材。
The
sputtering technique is widely employed in the production of optical coatings.
溅射技术广泛用于光学涂层的制作。
The
sputter cleaning method effectively removes surface contaminants.
溅射清洁法能有效去除表面污染物。
The
sputtering rate depends on the type of material used as the target.
溅射速率取决于作为靶材的材料类型。
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